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<article xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:ali="http://www.niso.org/schemas/ali/1.0/" article-type="other" dtd-version="1.2" xml:lang="en"><front><journal-meta><journal-id journal-id-type="publisher-id">Plasma Physics Reports</journal-id><journal-title-group><journal-title xml:lang="en">Plasma Physics Reports</journal-title><trans-title-group xml:lang="ru"><trans-title>Физика плазмы</trans-title></trans-title-group></journal-title-group><issn publication-format="print">0367-2921</issn><issn publication-format="electronic">3034-6371</issn><publisher><publisher-name xml:lang="en">The Russian Academy of Sciences</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="publisher-id">668434</article-id><article-id pub-id-type="doi">10.31857/S0367292123600589</article-id><article-id pub-id-type="edn">EQFVDB</article-id><article-categories><subj-group subj-group-type="toc-heading" xml:lang="en"><subject>INTERACTION OF PLASMA WITH SURFACES</subject></subj-group><subj-group subj-group-type="toc-heading" xml:lang="ru"><subject>ВЗАИМОДЕЙСТВИЕ ПЛАЗМЫ С ПОВЕРХНОСТЯМИ</subject></subj-group><subj-group subj-group-type="article-type"><subject>Unknown</subject></subj-group></article-categories><title-group><article-title xml:lang="en">Numerical Analysis of the Influence of Evaporation of the High- and Low-Melting-Point Anode Materials on Parameters of a Microarc Discharge</article-title><trans-title-group xml:lang="ru"><trans-title>Численное исследование влияния испарения материала тугоплавкого и нетугоплавкого анода на параметры микродугового разряда</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author"><name-alternatives><name xml:lang="en"><surname>Saifutdinov</surname><given-names>A. I.</given-names></name><name xml:lang="ru"><surname>Сайфутдинов</surname><given-names>А. И.</given-names></name></name-alternatives><email>as.uav@bk.ru</email><xref ref-type="aff" rid="aff1"/></contrib><contrib contrib-type="author"><name-alternatives><name xml:lang="en"><surname>Germanov</surname><given-names>N. P.</given-names></name><name xml:lang="ru"><surname>Германов</surname><given-names>Н. П.</given-names></name></name-alternatives><email>as.uav@bk.ru</email><xref ref-type="aff" rid="aff1"/></contrib><contrib contrib-type="author"><name-alternatives><name xml:lang="en"><surname>Sorokina</surname><given-names>A. R.</given-names></name><name xml:lang="ru"><surname>Сорокина</surname><given-names>А. Р.</given-names></name></name-alternatives><email>as.uav@bk.ru</email><xref ref-type="aff" rid="aff1"/></contrib><contrib contrib-type="author"><name-alternatives><name xml:lang="en"><surname>Saifutdinova</surname><given-names>A. A.</given-names></name><name xml:lang="ru"><surname>Сайфутдинова</surname><given-names>А. А.</given-names></name></name-alternatives><email>as.uav@bk.ru</email><xref ref-type="aff" rid="aff1"/></contrib></contrib-group><aff-alternatives id="aff1"><aff><institution xml:lang="en">Tupolev Kazan National Research Technical University</institution></aff><aff><institution xml:lang="ru">Казанский национальный исследовательский технический университет им. А.Н. Туполева – КАИ</institution></aff></aff-alternatives><pub-date date-type="pub" iso-8601-date="2023-10-01" publication-format="electronic"><day>01</day><month>10</month><year>2023</year></pub-date><volume>49</volume><issue>10</issue><issue-title xml:lang="ru"/><fpage>982</fpage><lpage>994</lpage><history><date date-type="received" iso-8601-date="2025-02-26"><day>26</day><month>02</month><year>2025</year></date></history><permissions><copyright-statement xml:lang="en">Copyright ©; 2023, Russian Academy of Sciences</copyright-statement><copyright-statement xml:lang="ru">Copyright ©; 2023, Российская академия наук</copyright-statement><copyright-year>2023</copyright-year><copyright-holder xml:lang="en">Russian Academy of Sciences</copyright-holder><copyright-holder xml:lang="ru">Российская академия наук</copyright-holder></permissions><self-uri xlink:href="https://journals.eco-vector.com/0367-2921/article/view/668434">https://journals.eco-vector.com/0367-2921/article/view/668434</self-uri><abstract xml:lang="en"><p>We present the results of numerical studies of the influence of evaporation of anode material on the main characteristics of an arc discharge. Calculations were carried out for an arc discharge in helium as a buffer gas with high-melting-point (using graphite as an example) and low-melting-point (using copper as an example) anodes. The dependences of the main arc-discharge parameters on current density are presented. It is demonstrated that intense evaporation of particles of the anode material into the discharge gap occurs upon reaching the melting point of the anode surface. As a result, the plasma-forming ion is replaced, i.e., the carbon ion in the case of the graphite anode or a copper ion in the case of the copper anode becomes dominant. In the process, a jump in the potential is observed in the dependence of voltage on current density (the volt–ampere characteristic, VAC). Distribution of the main plasma parameters along the discharge gap is presented for different points in the VAC.</p></abstract><trans-abstract xml:lang="ru"><p id="idm45257550710624">Представлены результаты численных исследований по влиянию испарения материала анода на основные характеристики дугового разряда. Расчеты проведены для дуги в буферном инертном газе – гелии с тугоплавким (на примере графита) и нетугоплавким (на примере меди) анодом. Представлены зависимости основных параметров дугового разряда от плотности тока. Показано, что при достижении температуры плавления поверхности анода наблюдается интенсивное испарение частиц анода в разрядный промежуток. Происходит смена плазмообразующего иона, т.е. доминирующим сортом ионов становится ион углерода в случае графитового анода, или ион меди – в случае медного. При этом на зависимости напряжения от плотности тока (ВАХ) разряда наблюдается скачок потенциала. Для различных значений точек на ВАХ представлены распределения основных параметров плазмы вдоль разрядного промежутка.</p></trans-abstract><kwd-group xml:lang="en"><kwd>microarc discharge in helium</kwd><kwd>numerical calculations</kwd><kwd>plasma parameters</kwd><kwd>graphite or copper</kwd><kwd>electrodes</kwd><kwd>anode melting and evaporation</kwd><kwd>potential jump</kwd></kwd-group><kwd-group xml:lang="ru"><kwd>микродуговой разряд в гелии</kwd><kwd>численные расчеты</kwd><kwd>параметры плазмы</kwd><kwd>графитовый или медный электроды</kwd><kwd>плавления и испарение анода</kwd><kwd>скачок потенциала</kwd></kwd-group><funding-group/></article-meta></front><body></body><back><ref-list><ref id="B1"><label>1.</label><mixed-citation>Райзер Ю.П. Физика газового разряда, М.: Интеллект, 2009.</mixed-citation></ref><ref id="B2"><label>2.</label><mixed-citation>Рохлин Г.Н. Разрядные источники света. М.: Энергоатомиздат, 1991. 720 с.</mixed-citation></ref><ref id="B3"><label>3.</label><mixed-citation>Fridman A., Gutsol A., Cho Y.I. Non-thermal atmospheric pressure plasma Advances in Heat Transfer ed A. Fridman, Y. Cho, A. George and A. B.-C. Greene. New York: Acad. Press, 2007.</mixed-citation></ref><ref id="B4"><label>4.</label><mixed-citation>Qin B., Zhang T., Chen H., Ma Y. // Carbon. 2016. T. 102. C. 494.</mixed-citation></ref><ref id="B5"><label>5.</label><mixed-citation>Park Y.S., Kodama S., Sekiguchi H. // Nanomaterials. 2021. T. 11. № 9. C. 2214.</mixed-citation></ref><ref id="B6"><label>6.</label><mixed-citation>Vekselman V., Raitses Y., Shneider M.N. // Physical Review E. 2019. T. 99. № 6. C. 063205.</mixed-citation></ref><ref id="B7"><label>7.</label><mixed-citation>Timerkaev B.A., Kaleeva A.A., Timerkaeva D.B., Saifutdinov A.I. // High Energy Chemistry. 2019. T. 53. C. 390.</mixed-citation></ref><ref id="B8"><label>8.</label><mixed-citation>Shavelkina M.B., Ivanov P.P., Bocharov A.N., Ami-rov R.H. // Plasma Chemistry and Plasma Processing. 2021. T. 41. C. 171.</mixed-citation></ref><ref id="B9"><label>9.</label><mixed-citation>Nowack M., Leidich S., Reuter D., Kurth S., Kuech-ler M., Bertz A., Gessner T. // Sensors and Actuators A: Physical. 2012. T. 188. C. 495.</mixed-citation></ref><ref id="B10"><label>10.</label><mixed-citation>Jhavar S., Paul C.P., Jain N.K. // Jom. 2016. T. 68. C. 1801.</mixed-citation></ref><ref id="B11"><label>11.</label><mixed-citation>Keidar M., Beilis I.I. // J. Appl. Phys. 2009. V. 106. 103304</mixed-citation></ref><ref id="B12"><label>12.</label><mixed-citation>Lebouvier A., Iwarere S.A., Ramjugernath D., Fulche-ri L. // Journal of Physics D: Applied Physics. 2013. V. 46. № 14. P. 145203.</mixed-citation></ref><ref id="B13"><label>13.</label><mixed-citation>Timofeev N.A., Sukhomlinov V.S., Zissis G., Mukharae-va I.Yu., Mikhaylov D.V., Mustafaev A.S., Dupuis P., Solikhov D.Q., Borodina V.S. // IEEE Transactions on Plasma Science. 2021. V. 49. № 8. P. 2387.</mixed-citation></ref><ref id="B14"><label>14.</label><mixed-citation>Maharaj A., D’Angola A., Colonna G., Iwarere S.A. // Frontiers in Physics. 2021. V. 9. C. 652.</mixed-citation></ref><ref id="B15"><label>15.</label><mixed-citation>Musielok J. // Contributions to Plasma Physics. 1977. V. 17. P. 135.</mixed-citation></ref><ref id="B16"><label>16.</label><mixed-citation>Cram L.E., Poladian L., Roumeliotis G. // Journal of Physics D: Applied Physics. 1988. V. 21. P. 418.</mixed-citation></ref><ref id="B17"><label>17.</label><mixed-citation>Almeida N.A., Benilov M.S., Naidis G.V. // Journal of Physics D: Applied Physics. 2008. V. 41. № 24. P. 245201.</mixed-citation></ref><ref id="B18"><label>18.</label><mixed-citation>Almeida N.A., Benilov M.S., Hechtfischer U., Nai-dis G.V. // Journal of Physics D: Applied Physics. 2009. V. 42. № 4. P. 045210.</mixed-citation></ref><ref id="B19"><label>19.</label><mixed-citation>Kolev S., Bogaerts A.A. // Plasma Sources Science and Technology. 2014. V. 24. № 1. P. 015025.</mixed-citation></ref><ref id="B20"><label>20.</label><mixed-citation>Saifutdinov A.I., Fairushin I.I., Kashapov N.F. / JETP Letters. 2016. V. 104. № 3. P. 180.</mixed-citation></ref><ref id="B21"><label>21.</label><mixed-citation>Eliseev S.I., Kudryavtsev A.A., Liu H., Ning Zh., Yu D., Chirtsov A.S. // IEEE Transactions on Plasma Science. 2016. V. 44. № 11. P. 2536.</mixed-citation></ref><ref id="B22"><label>22.</label><mixed-citation>Semenov I.L., Krivtsun I.V., Reisgen U. // Journal of Physics D: Applied Physics. 2016. V. 49. № 10. P. 105204.</mixed-citation></ref><ref id="B23"><label>23.</label><mixed-citation>Almeida N.A., Cunha M.D., Benilov M.S. // Journal of Physics D: Applied Physics. 2017. V. 50. № 38. P. 385203.</mixed-citation></ref><ref id="B24"><label>24.</label><mixed-citation>Kolev S., Sun S., Trenchev G., Wang W., Wang H., Bogaerts A. // Plasma Processes and Polymers. 2017. V. 14. № 4-5. C. 1600110.</mixed-citation></ref><ref id="B25"><label>25.</label><mixed-citation>Khrabry A., Kaganovich I.D., Nemchinsky V., Khodak A. // Physics of Plasmas. 2018. V. 25. № 1.</mixed-citation></ref><ref id="B26"><label>26.</label><mixed-citation>Khrabry A., Kaganovich I.D., Nemchinsky V., Khodak A. // Physics of Plasmas. 2018. V. 25. № 1. P. 013522</mixed-citation></ref><ref id="B27"><label>27.</label><mixed-citation>Baeva M., Loffhagen D., Becker M. M., Uhrlandt D. // Plasma Chemistry and Plasma Processing. 2019. V. 39. № 4. C. 949.</mixed-citation></ref><ref id="B28"><label>28.</label><mixed-citation>Baeva M., Loffhagen D., Uhrlandt D. // Plasma Chemistry and Plasma Processing. 2019. V. 39. № 6. C. 1359.</mixed-citation></ref><ref id="B29"><label>29.</label><mixed-citation>Benilov M.S. // Journal of Physics D: Applied Physics. 2019. V. 53. № 1. C. 013002.</mixed-citation></ref><ref id="B30"><label>30.</label><mixed-citation>Saifutdinov A.I., Timerkaev B.A., Saifutdinova A.A. // JETP Letters. 2020. V. 112. 7. P. 405.</mixed-citation></ref><ref id="B31"><label>31.</label><mixed-citation>Saifutdinov A.I. // Journal of Applied Physics. 2021. V. 129. № 9. P. 093302.</mixed-citation></ref><ref id="B32"><label>32.</label><mixed-citation>Saifutdinov A.I. // Plasma Sources Science and Technology. 2022. V. 31. № 9. P. 094008.</mixed-citation></ref><ref id="B33"><label>33.</label><mixed-citation>Baeva M., Benilov M.S., Zhu T., Testrich H., Kewitz T., Foest R. // Journal of Physics D: Applied Physics. 2022. V. 55. № 36. P. 365202.</mixed-citation></ref><ref id="B34"><label>34.</label><mixed-citation>Santos D.F.N., Almeida N.A., Lisnyak M., Gonnet J.P., Benilov M.S. // Physics of Plasmas. 2022. T. 29. № 4. P. 043503.</mixed-citation></ref><ref id="B35"><label>35.</label><mixed-citation>Baeva M., Methling R., Uhrlandt D. // Plasma Physics and Technology. 2021. V. 8. № 1. P. 1.</mixed-citation></ref><ref id="B36"><label>36.</label><mixed-citation>Wang W.Z., Rong M.Z., Murphy A.B., Yi Wu, Spen-cer J.W., Yan J.D., Michael T., C Fang // Journal of Physics D: Applied Physics. 2011. V. 44. № 35. P. 355207.</mixed-citation></ref><ref id="B37"><label>37.</label><mixed-citation>Cressault Y., Murphy A.B., Teulet Ph., Gleizes A. Schnick M. // Journal of Physics D: Applied Physics. 2013. V. 46. № 41. C. 415207.</mixed-citation></ref><ref id="B38"><label>38.</label><mixed-citation>Кнаке О., Странский И.Н. // Успехи физических наук. 1959. V. 68. № 6. С. 261.</mixed-citation></ref><ref id="B39"><label>39.</label><mixed-citation>Thorn R.J., Winslow G.H. // The Journal of Chemical Physics. 1957. V. 26. № 1. P. 186.</mixed-citation></ref><ref id="B40"><label>40.</label><mixed-citation>Nielsen T., Kaddani A., Benilov M.S. // Journal of Physics D: Applied Physics. 2001. V. 34(13) P. 2016.</mixed-citation></ref><ref id="B41"><label>41.</label><mixed-citation>Nemchinsky V. // Journal of Applied Physics. 2021. V. 130. № 10. P. 103304.</mixed-citation></ref><ref id="B42"><label>42.</label><mixed-citation>Kutasi K., Hartmann P., Donkó Z. // Journal of Physics D: Applied Physics. 2001. V. 34. № 23. P. 3368.</mixed-citation></ref><ref id="B43"><label>43.</label><mixed-citation>Kutasi K., Hartmann P., Bánó G., Donkó Z. // Plasma Sources Science and Technology. 2005. V. 14. № 2. P. S1.</mixed-citation></ref><ref id="B44"><label>44.</label><mixed-citation>Богданов Е. А., Капустин К.Д., Кудрявцев А.А., Чирцов А.С. // Журнал технической физики. 2010. Т. 80. № 10. С. 41.</mixed-citation></ref><ref id="B45"><label>45.</label><mixed-citation>Wang Q., Economou D.J., Donnelly V.M. // Journal of Applied Physics. 2006. V. 100. № 2. P. 023301.</mixed-citation></ref><ref id="B46"><label>46.</label><mixed-citation>Deloche R., Monchicourt P., Cheret M., Lambert F. // Physical Review A. 1976. V. 13. № 3. P. 1140.</mixed-citation></ref><ref id="B47"><label>47.</label><mixed-citation>Saifutdinov A.I., Sorokina A.R., Boldysheva V.K., Latypov E.R., Saifutdinova A.A. // High Energy Chemistry. 2022. V. 56. № 6. C. 477.</mixed-citation></ref><ref id="B48"><label>48.</label><mixed-citation>Mansour A.R., Hara K. // Journal of Physics D: Applied Physics. 2019. T. 52. № 10. C. 105204.</mixed-citation></ref><ref id="B49"><label>49.</label><mixed-citation>Bogaerts A., Gijbels R., Carman R. // Spectrochimica Acta Part B: Atomic Spectroscopy. 1998. V. 53. № 12. P. 1679.</mixed-citation></ref><ref id="B50"><label>50.</label><mixed-citation>Bogaerts A., Gijbels R. // Journal of Applied Physics. 2002. T. 92. № 11. C. 6408.</mixed-citation></ref></ref-list></back></article>
