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<article xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:ali="http://www.niso.org/schemas/ali/1.0/" article-type="research-article" dtd-version="1.2" xml:lang="en"><front><journal-meta><journal-id journal-id-type="publisher-id">Stankoinstrument</journal-id><journal-title-group><journal-title xml:lang="en">Stankoinstrument</journal-title><trans-title-group xml:lang="ru"><trans-title>Станкоинструмент</trans-title></trans-title-group></journal-title-group><issn publication-format="print">2499-9407</issn><publisher><publisher-name xml:lang="en">Technosphera JSC</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="publisher-id">678979</article-id><article-id pub-id-type="doi">10.22184/2499-9407.2025.38.1.62.68</article-id><article-categories><subj-group subj-group-type="toc-heading" xml:lang="en"><subject>TOOLS AND TOOL SYSTEMS</subject></subj-group><subj-group subj-group-type="toc-heading" xml:lang="ru"><subject>ИНСТРУМЕНТ И ИНСТРУМЕНТАЛЬНЫЕ СИСТЕМЫ</subject></subj-group><subj-group subj-group-type="article-type"><subject>Research Article</subject></subj-group></article-categories><title-group><article-title xml:lang="en">Wear of High Entropy (HEC) Ion-Plasma (AlCrZrTiTa)N Coating Under High-Speed Dry Cutting</article-title><trans-title-group xml:lang="ru"><trans-title>Износ высокоэнтропийного (HEC) ионно-плазменного (AlCrZrTiTa)N покрытия при высокоскоростном сухом резании</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author"><name-alternatives><name xml:lang="en"><surname>Kovalev</surname><given-names>A. I.</given-names></name><name xml:lang="ru"><surname>Ковалев</surname><given-names>Анатолий Иванович</given-names></name></name-alternatives><address><country country="RU">Russian Federation</country></address><bio xml:lang="ru"><p>кандидат технических наук, и. о. директора </p></bio><email>journal@electronics.ru</email><xref ref-type="aff" rid="aff1"/></contrib><contrib contrib-type="author"><name-alternatives><name xml:lang="en"><surname>Konovalov</surname><given-names>E. P.</given-names></name><name xml:lang="ru"><surname>Коновалов</surname><given-names>Егор Павлович</given-names></name></name-alternatives><address><country country="RU">Russian Federation</country></address><bio xml:lang="ru"><p>младший научный сотрудник</p></bio><email>journal@electronics.ru</email><xref ref-type="aff" rid="aff2"/></contrib><contrib contrib-type="author"><name-alternatives><name xml:lang="en"><surname>Vakhrushev</surname><given-names>V. O.</given-names></name><name xml:lang="ru"><surname>Вахрушев</surname><given-names>Владимир Олегович</given-names></name></name-alternatives><address><country country="RU">Russian Federation</country></address><bio xml:lang="ru"><p>кандидат физико-математических наук, младший научный сотрудник</p></bio><email>journal@electronics.ru</email><xref ref-type="aff" rid="aff2"/></contrib><contrib contrib-type="author"><name-alternatives><name xml:lang="en"><surname>Weinstein</surname><given-names>D. L.</given-names></name><name xml:lang="ru"><surname>Вайнштейн</surname><given-names>Дмитрий Львович</given-names></name></name-alternatives><address><country country="RU">Russian Federation</country></address><bio xml:lang="ru"><p>кандидат физико-математических наук, начальник лаборатории </p></bio><email>journal@electronics.ru</email><xref ref-type="aff" rid="aff2"/></contrib><contrib contrib-type="author"><name-alternatives><name xml:lang="en"><surname>Dmitrievsky</surname><given-names>S. A.</given-names></name><name xml:lang="ru"><surname>Дмитриевский</surname><given-names>Станислав Алексеевич</given-names></name></name-alternatives><address><country country="RU">Russian Federation</country></address><bio xml:lang="ru"><p>младший специалист </p></bio><email>journal@electronics.ru</email><xref ref-type="aff" rid="aff3"/></contrib></contrib-group><aff-alternatives id="aff1"><aff><institution xml:lang="en"></institution></aff><aff><institution xml:lang="ru">НЦМФМ ФГУП «ЦНИИчермет им. И. П. Бардина»</institution></aff></aff-alternatives><aff-alternatives id="aff2"><aff><institution xml:lang="en"></institution></aff><aff><institution xml:lang="ru">ФГУП «ЦНИИчермет им. И. П. Бардина»</institution></aff></aff-alternatives><aff-alternatives id="aff3"><aff><institution xml:lang="en"></institution></aff><aff><institution xml:lang="ru">ООО НТВП «Поверхность»</institution></aff></aff-alternatives><pub-date date-type="pub" iso-8601-date="2025-05-13" publication-format="electronic"><day>13</day><month>05</month><year>2025</year></pub-date><issue>1</issue><issue-title xml:lang="en"/><issue-title xml:lang="ru"/><fpage>62</fpage><lpage>68</lpage><history><date date-type="received" iso-8601-date="2025-04-28"><day>28</day><month>04</month><year>2025</year></date><date date-type="accepted" iso-8601-date="2025-04-28"><day>28</day><month>04</month><year>2025</year></date></history><permissions><copyright-statement xml:lang="en">Copyright ©; 2025, Kovalev A.I., Konovalov E.P., Vakhrushev V.O., Weinstein D.L., Dmitrievsky S.A.</copyright-statement><copyright-statement xml:lang="ru">Copyright ©; 2025, Ковалев А.И., Коновалов Е.П., Вахрушев В.О., Вайнштейн Д.Л., Дмитриевский С.А.</copyright-statement><copyright-year>2025</copyright-year><copyright-holder xml:lang="en">Kovalev A.I., Konovalov E.P., Vakhrushev V.O., Weinstein D.L., Dmitrievsky S.A.</copyright-holder><copyright-holder xml:lang="ru">Ковалев А.И., Коновалов Е.П., Вахрушев В.О., Вайнштейн Д.Л., Дмитриевский С.А.</copyright-holder></permissions><self-uri xlink:href="https://journals.eco-vector.com/2499-9407/article/view/678979">https://journals.eco-vector.com/2499-9407/article/view/678979</self-uri><abstract xml:lang="en"><p>Experiments on dry high-speed cutting of a cutting plate with a high-entropy ion-plasma coating based on (AlCrZrTiTa)N with a thickness of about 3.0 μm have been carried out (It was performed during the 130 m run-in phase and after cutting for 260 m). It is shown that tribological adaptation of the coating from high-entropy nitride with amorphous-nanocrystalline structure under conditions of high-speed dry cutting is a nonequilibriumprocess and includes partial oxidation of nitride fragments and dynamic competitive formation of protective films of triboxides with thermal barrier and antifriction properties from the very initial stages of cutting.</p></abstract><trans-abstract xml:lang="ru"><p>Проведены эксперименты по сухому высокоскоростному резанию режущей пластины с высокоэнтропийным ионно-плазменным покрытием на основе (AlCrZrTiTa)N толщиной порядка 3,0 мкм (на стадии приработки длительностью 130 м и после резания в течение 260 м). Показано, что трибологическая адаптация покрытия из высокоэнтропийного нитрида с аморфно-нанокристаллической структурой в условиях высокоскоростного сухого резания является неравновесным процессом и включает в себя частичное окисление фрагментов нитрида и динамическое конкурентное образование защитных пленок трибооксидов с термобарьерными и антифрикционными свойствами с самых начальных стадий резания.</p></trans-abstract><kwd-group xml:lang="en"><kwd>high-entropy nitride coating</kwd><kwd>high-speed dry cutting</kwd><kwd>tribo-oxidation</kwd><kwd>Raman spectroscopy</kwd><kwd>Auger microscopy</kwd><kwd>HREELFS</kwd></kwd-group><kwd-group xml:lang="ru"><kwd>высокоэнтропийное нитридное покрытие</kwd><kwd>высокоскоростное сухое резание</kwd><kwd>трибоокисление</kwd><kwd>рамановская спектрокопия</kwd><kwd>оже-микроскопия</kwd><kwd>HREELFS</kwd></kwd-group><funding-group/></article-meta></front><body></body><back><ref-list><ref id="B1"><label>1.</label><mixed-citation>Yeh J.-W., Chen S.-K., Lin S.-J., Gan J.-Y., Chin T.-S., Shun T.-T., Tsau C.-H., Chang S.-Y. 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