LITHOGRAPHY

Issue	Title	File
Vol 54, No 4 (2025)	Perspectives of electron-beam and ion-beam lithography development in Russia	(Rus)
Zaitsev S.I., Irzhak D.V., Il’in A.I., Knyazev M.A., Roshchupkin D.V., Grachev V.P., Kurbatov V.G., Malkov G.V.
Vol 54, No 6 (2025)	STABILIZING PROCESSING OF NEGATIVE PHOTORESIST FILMS OF THE AZ nLOF20XX SERIES ON SILICON	(Rus)
Prosolovich V.S., Brinkevich D.I., Grinyuk E.V., Yankouski Y.N., Zubova O.A., Brinkevich S.D., Vabishchevich S.A.
Vol 54, No 1 (2025)	Investigation of double patterning method with the usage of antispacer	(Rus)
Tikhonova E.D., Gornev E.S.
Vol 53, No 5 (2024)	New concept for the development of high-performance X-ray lithography	(Rus)
Chkhalo N.I.
Vol 52, No 5 (2023)	Protective Freely Hanging Films for Projection Lithography Installations in the Extreme UV Range	(Rus)
Zuev S.Y., Lopatin A.Y., Luchin V.I., Salashchenko N.N., Tsybin N.N., Chkhalo N.I.
Vol 52, No 2 (2023)	Cross Sections of Scattering Processes in Electron-Beam Lithography	(Rus)
Rogozhin A.E., Sidorov F.A.
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