Мақаланы E-mail арқылы жіберу Spray photoresist application to create a uniform film in cavities
- Авторлар: Ivanov V.1
-
Мекемелер:
- ООО «ТТМ»
- Шығарылым: № 7 (2024)
- Беттер: 182-188
- Бөлім: Manufacturing technologies
- URL: https://journals.eco-vector.com/1992-4178/article/view/636203
- DOI: https://doi.org/10.22184/1992-4178.2024.238.7.182.188
- ID: 636203
Дәйексөз келтіру
Ашық рұқсат
Рұқсат берілді
Аннотация
The article studies a method for obtaining coatings using a spray application system. The process parameters such as table rotation speed, nozzle movement speed, mixture flow, nozzle tilt angle, etc. were optimized.
Негізгі сөздер
Толық мәтін
Авторлар туралы
V. Ivanov
ООО «ТТМ»
Хат алмасуға жауапты Автор.
Email: vi@ttmicro.ru
начальник технического отдела
РесейӘдебиет тізімі
- Duk-Soo Eun, Do-Wok Kim et al. Photoresist Spray Coating for Resist Film Performance of Deep Silicon Cavities // Journal of the Korean Physical Society. Vol. 50. No. 6. June 2007. PP. 1947–1951.
- Tonnies D. Spray coating & lithography technology for 3D topological structures // 5th SECAP seminare. Nov. 2004.
- Pham, N.P. et al. Spray coating of photoresist for pattern transfer on high topography surfaces // J. Micromech. Microeng. 15 (2005). PP. 691–697.
- Park H. et al. Design and Fabrication of the Double-Sided Silicon Microstrip Sensor // J. Korean Phys. Soc. 49. 1401 (2006).
Қосымша файлдар
Қосымша файлдар
Әрекет
1.
JATS XML
2.
Fig. 1. Schematic diagram of photoresist spray application
Жүктеу (212KB)
3.
Fig. 2. Problems during the application of photoresist in cavities by centrifugation (a), uniform coverage of the cavity with a layer of photoresist by spray application (b)
Жүктеу (763KB)
4.
Fig. 3. Schematic diagram of the main module of the photoresist spraying unit
Жүктеу (880KB)
5.
Fig. 4. Division of the plate into nine sections for photoresist thickness measurements (a), photoresist thickness at different nozzle movement speeds at a stage rotation speed of 30 rpm (b)
Жүктеу (261KB)
6.
Fig. 5. Measurement of the photoresist layer thickness using SEM on the cross section of the cavity corner (a), cross section of the cavity bottom (b)
Жүктеу (440KB)
7.
Fig. 6. Measurement of the photoresist layer thickness using SEM on the plate (a), cross section of the cavity corner (b), cross section of the cavity bottom (c)
Жүктеу (800KB)
8.
Fig. 7. Coated optical parts
Жүктеу (620KB)
9.
Fig. 8. Plastic part with applied protective coating
Жүктеу (784KB)
