Email this article Spray photoresist application to create a uniform film in cavities
- Authors: Ivanov V.1
-
Affiliations:
- ООО «ТТМ»
- Issue: No 7 (2024)
- Pages: 182-188
- Section: Manufacturing technologies
- URL: https://journals.eco-vector.com/1992-4178/article/view/636203
- DOI: https://doi.org/10.22184/1992-4178.2024.238.7.182.188
- ID: 636203
Cite item
Open Access
Access granted
Abstract
The article studies a method for obtaining coatings using a spray application system. The process parameters such as table rotation speed, nozzle movement speed, mixture flow, nozzle tilt angle, etc. were optimized.
Full Text
About the authors
V. Ivanov
ООО «ТТМ»
Author for correspondence.
Email: vi@ttmicro.ru
начальник технического отдела
Russian FederationReferences
- Duk-Soo Eun, Do-Wok Kim et al. Photoresist Spray Coating for Resist Film Performance of Deep Silicon Cavities // Journal of the Korean Physical Society. Vol. 50. No. 6. June 2007. PP. 1947–1951.
- Tonnies D. Spray coating & lithography technology for 3D topological structures // 5th SECAP seminare. Nov. 2004.
- Pham, N.P. et al. Spray coating of photoresist for pattern transfer on high topography surfaces // J. Micromech. Microeng. 15 (2005). PP. 691–697.
- Park H. et al. Design and Fabrication of the Double-Sided Silicon Microstrip Sensor // J. Korean Phys. Soc. 49. 1401 (2006).
Supplementary files
Supplementary Files
Action
1.
JATS XML
2.
Fig. 1. Schematic diagram of photoresist spray application
Download (212KB)
3.
Fig. 2. Problems during the application of photoresist in cavities by centrifugation (a), uniform coverage of the cavity with a layer of photoresist by spray application (b)
Download (763KB)
4.
Fig. 3. Schematic diagram of the main module of the photoresist spraying unit
Download (880KB)
5.
Fig. 4. Division of the plate into nine sections for photoresist thickness measurements (a), photoresist thickness at different nozzle movement speeds at a stage rotation speed of 30 rpm (b)
Download (261KB)
6.
Fig. 5. Measurement of the photoresist layer thickness using SEM on the cross section of the cavity corner (a), cross section of the cavity bottom (b)
Download (440KB)
7.
Fig. 6. Measurement of the photoresist layer thickness using SEM on the plate (a), cross section of the cavity corner (b), cross section of the cavity bottom (c)
Download (800KB)
8.
Fig. 7. Coated optical parts
Download (620KB)
9.
Fig. 8. Plastic part with applied protective coating
Download (784KB)
